Name: Focused Ion Beam (FIB)
Type: equipment for surface engineering
Owner: Center odličnosti nanoznanosti in nanotehnologije (CO NIN)
Year of acq.: 2012
KET field: Nanotechnology
Micro- and Nano-electronics
Price for usage (EUR/h): 80
Responsible person: Miran Čeh
Responsible person email: Miran.Ceh@ijs.si
Possibilities to rent: Research is performed by researcher of JSI.
Purchase value (EUR): 1018799
Description/Usage: Focused ion beam, shortly FIB, is a technique used in the semiconductor industry, materials science and in the biology field for site-specific analysis, deposition and ablation of materials using accelerated ions. A dual-beam setup is a scientific instrument that comprise of a scanning electron microscope (SEM) for imaging of sample surface and ion beam for etching or machining.
Instrument is used for nano-pattering, TEM sample preparation, 3D tomography and deposition of thin conductive or dielectric films via ion-beam induced deposition.
JSI Inventory number: