IJS Oprema

ID: 9653

Name: Focused Ion Beam (FIB)

Type: equipment for surface engineering

Owner: Center odličnosti nanoznanosti in nanotehnologije (CO NIN)

Dept.: CEMM

Year of acq.: 2012

KET field: Nanotechnology
Advanced materials
Micro- and Nano-electronics

Price for usage (EUR/h): 80

Responsible person: Miran Čeh

Responsible person email: Miran.Ceh@ijs.si

Possibilities to rent: Research is performed by researcher of JSI.

Purchase value (EUR): 1018799

Description/Usage: Focused ion beam, shortly FIB, is a technique used in the semiconductor industry, materials science and in the biology field for site-specific analysis, deposition and ablation of materials using accelerated ions. A dual-beam setup is a scientific instrument that comprise of a scanning electron microscope (SEM) for imaging of sample surface and ion beam for etching or machining. Instrument is used for nano-pattering, TEM sample preparation, 3D tomography and deposition of thin conductive or dielectric films via ion-beam induced deposition.

JSI Inventory number:

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