Name: Pulsed Laser Deposition (PLD) system
Type: equipment for surface engineering
Owner: Center odličnosti nanoznanosti in nanotehnologije (CO NIN)
Year of acq.: 2012
KET field: Nanotechnology
Price for usage (EUR/h): 60
Responsible person: Matjaž Spreitzer
Responsible person email: Matjaz.Spreitzer@ijs.si
Possibilities to rent: Research is performed by researcher of JSI.
Purchase value (EUR): 912436
Description/Usage: Pulsed laser deposition is a technique for thin-film growth of inorganic materials mainly. The delivered system is dedicated for layer-by-layer growth and thus enables preparation of high quality thin films and structuring on nanoscopic level. The system is equipped with several major components. For ablation of target material KrF excimer laser is used with energy up to 700 mJ per pulse and max. repetition rate of 50 Hz. For laser-energy setting and diagnostics attenuator and corresponding camera are used, respectively.
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